400kHz 15kW Power Generator for Semi/Display Process type.
Environmentally friendly plasma power supply equipment (or plasma cleaning source)
for semiconductor and display manufacturing productivity improves F (fluorine) radicals to chemically clean Si (silicon) accumulated
in the chamber after the deposition process in semiconductor and display manufacturing processes.
It is a product that supplies the power of plasma generator to vaporize with fluorine mixture.
This allows the Si powder debris to be transported inside the chamber to be vaporized and discharged out through a vacuum pump.
The conventional process chamber pump performed only a function of
discharging Si powder inside the chamber by a simple vacuum pump function.
But as gas usage is increased and yield is required for semiconductor and display processes,
it is impossible to operate for vacuum pumps and the power supply system using plasma is capable of large capacity processing.